Posts Tagged ‘High-Volume Scale-Up’

Mathieu R. Monville1, Shihsheng Chang1, Samuel Wright1, Karlheinz Strobl1
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Silicon nanowires (SiNWs) attract growing interest due to their high multi-functional potential, spanning from energy harvesting and storage, thermoelectricity, and protein detection to gas sensing applications.

A narrow distribution in properties (length, diameter, doping levels) and microscopic arrangement are sought-after for most applications for which reducing materials production costs is often a necessary condition for development. Specific arrangement of silicon nanowires vertically or even horizontally

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Graphene, carbon nanotubes (CNTs), silicon nanowires (SiNWs) and many other nanomaterials and thin films can be produced on flexible, often metallic, substrates using chemical vapour deposition (CVD) based processing. CVD tools can be implemented in many different ways to produce a wide range of material compositions and geometries (OD, 1D, 2D and 3D).

Most traditional style CVD tools are limited in production volume