Karlheinz Strobl, Mathieu Monville, Riju Singhal, and Samuel Wright
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA
Chemical vapour deposition (CVD) is recognized as the most promising technique for the scale-up of higher quality graphene production for a wide range of applications. There is particular interest in the CVD of graphene on copper, where the number of atomic layers can be controlled down to a monolayer.
The quality of the deposited graphene can be quantified in terms of several physical properties, including