Posts Tagged ‘Monolayer’

Riju Singhal1, Mathieu Monville1, Samuel Wright1, Karlheinz Strobl1
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

In recent years, exceptional physical and chemical properties of graphene have been demonstrated and widely acknowledged. Graphene films synthesized by Chemical Vapor Deposition (CVD) with different configurations (monolayer, bilayer, multilayer, etc.) and grain sizes (up to cm size) were developed to offer a wide range of electrical and chemical properties facilitating their application in several fields. This led to numerous investigations on the potential use of CVD

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, NY 11722, USA

Abstract

Our EasyGraphene™ R&D and production tools enable our patent pending solution for low-cost, high-volume, high quality CVD graphene on Cu foil. Together our EasyGraphene™ system enables:

Better thermal control over the CVD graphene process: Figure 1 (a) is a photograph of a 300 mm x 300 mm 18 µm thick electropolished Cu foil subjected to 2 hour annealing and 2 hour CVD graphene growth at 1020 °C

Karlheinz Strobl, Mathieu Monville, Riju Singhal, and Samuel Wright
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Chemical vapour deposition (CVD) is recognized as the most promising technique for the scale-up of higher quality graphene production for a wide range of applications. There is particular interest in the CVD of graphene on copper, where the number of atomic layers can be controlled down to a monolayer.

The quality of the deposited graphene can be quantified in terms of several physical properties, including