Low-Cost, High-Volume Scale-Up of CVD graphene on Cu Foil

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, NY 11722, USA


Our EasyGraphene™ R&D and production tools enable our patent pending solution for low-cost, high-volume, high quality CVD graphene on Cu foil. Together our EasyGraphene™ system enables:

Better thermal control over the CVD graphene process: Figure 1 (a) is a photograph of a 300 mm x 300 mm 18 µm thick electropolished Cu foil subjected to 2 hour annealing and 2 hour CVD graphene growth at 1020 °C