09
December
Thin Film ZnO:B 25 K X – Top
Thin film of boron doped zinc oxide deposited by metal organic chemical vapor deposition (MOCVD) using a FirstNano® EasyTube® system.
December
09
December
Thin Film ZnO:B 10 K X – Top
Thin film of boron doped zinc oxide deposited by metal organic chemical vapor deposition (MOCVD) using a FirstNano® EasyTube® system.
06
November
Thin Film ZnO:B 100 K X – Top
Thin film of boron doped zinc oxide deposited by metal organic chemical vapor deposition (MOCVD) using a FirstNano® EasyTube® system.
06
November
Thin Film ZnO:B 25 K X
Thin film of boron doped zinc oxide deposited by metal organic chemical vapor deposition (MOCVD) using a FirstNano® EasyTube® system.
06
November
Thin Film ZnO:B – 80 K X
Thin film of boron doped zinc oxide deposited by metal organic chemical vapor deposition (MOCVD) using a FirstNano® EasyTube® system.