Category Archive for : ‘Conference Papers’

Riju Singhal, Mathieu R. Monville, Shihsheng Chang, Karlheinz Strobl
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, NY 11722, USA

Abstract

Inexpensive approaches for the synthesis of high-quality CVD graphene is sought after in order to have graphene enter industrial fabrication and be made available for commercial applications. Depending on the nature and preparation of the catalyst substrate, the precursor used and the processing conditions of CVD growth (pressure, temperature, gas ratios), growth kinetics and regimes can change drastically and lead to diverse forms of graphene (partial or

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Many different processing methods have been demonstrated over the last 20 year for 1D and 2D nanomaterial manufacturing. Worldwide interest over the last 10 years has been focused on advancing the state of the art and quality of CVD graphene manufacturing. A wide range of CVD manufacturing methods and equipment solutions have been explored and their respective benefits and drawback analyzed in relation to the quality and

Mathieu R. Monville1, Shihsheng Chang1, Samuel Wright1, Karlheinz Strobl1
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Silicon nanowires (SiNWs) attract growing interest due to their high multi-functional potential, spanning from energy harvesting and storage, thermoelectricity, and protein detection to gas sensing applications.

A narrow distribution in properties (length, diameter, doping levels) and microscopic arrangement are sought-after for most applications for which reducing materials production costs is often a necessary condition for development. Specific arrangement of silicon nanowires vertically or even horizontally

Riju Singhal1, Mathieu Monville1, Samuel Wright1, Karlheinz Strobl1
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

In recent years, exceptional physical and chemical properties of graphene have been demonstrated and widely acknowledged. Graphene films synthesized by Chemical Vapor Deposition (CVD) with different configurations (monolayer, bilayer, multilayer, etc.) and grain sizes (up to cm size) were developed to offer a wide range of electrical and chemical properties facilitating their application in several fields. This led to numerous investigations on the potential use of CVD

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Graphene and other 2D materials can be produced by chemical vapor deposition (CVD) processing.  CVD processing can also be used to manufacture many 1D nanomaterials such as carbon nanotubes and silicon nanowires as well as for a wide range of film depositions and other related surface modifications.  The related CVD substrates can be rigid or flexible, and can be in continuous rolls or discrete stacks.

Industrial CVD production

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

CVD graphene grown on Cu or Ni film coated Si wafers or flexible Cu foil substrates is a promising starting material for many novel product developments efforts.  Small scale CVD graphene production has traditionally been accomplished in CVD tube furnace systems.  Such systems allow for a limited production volume as a result of the size constraints of the substrates that can fit inside

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Process development for CVD graphene is typically being done on Cu or Ni substrates in a CVD tube furnace system.  Traditionally such systems allow only limited production volume as a result of the size constraints of the substrates that can fit inside a given process chamber.  Therefore, in order to commercialize applications enabled by CVD graphene films, new scale up solutions need to

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Graphene, carbon nanotubes (CNTs), silicon nanowires (SiNWs) and many other nanomaterials and thin films can be produced on flexible, often metallic, substrates using chemical vapour deposition (CVD) based processing. CVD tools can be implemented in many different ways to produce a wide range of material compositions and geometries (OD, 1D, 2D and 3D).

Most traditional style CVD tools are limited in production volume

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, NY 11722, USA

Abstract

Our EasyGraphene™ R&D and production tools enable our patent pending solution for low-cost, high-volume, high quality CVD graphene on Cu foil. Together our EasyGraphene™ system enables:

Better thermal control over the CVD graphene process: Figure 1 (a) is a photograph of a 300 mm x 300 mm 18 µm thick electropolished Cu foil subjected to 2 hour annealing and 2 hour CVD graphene growth at 1020 °C

Karlheinz Strobl, Mathieu Monville, Riju Singhal, and Samuel Wright
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Chemical vapour deposition (CVD) is recognized as the most promising technique for the scale-up of higher quality graphene production for a wide range of applications. There is particular interest in the CVD of graphene on copper, where the number of atomic layers can be controlled down to a monolayer.

The quality of the deposited graphene can be quantified in terms of several physical properties, including