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Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

CVD graphene grown on Cu or Ni film coated Si wafers or flexible Cu foil substrates is a promising starting material for many novel product developments efforts.  Small scale CVD graphene production has traditionally been accomplished in CVD tube furnace systems.  Such systems allow for a limited production volume as a result of the size constraints of the substrates that can fit inside

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Process development for CVD graphene is typically being done on Cu or Ni substrates in a CVD tube furnace system.  Traditionally such systems allow only limited production volume as a result of the size constraints of the substrates that can fit inside a given process chamber.  Therefore, in order to commercialize applications enabled by CVD graphene films, new scale up solutions need to

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, and Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Graphene, carbon nanotubes (CNTs), silicon nanowires (SiNWs) and many other nanomaterials and thin films can be produced on flexible, often metallic, substrates using chemical vapour deposition (CVD) based processing. CVD tools can be implemented in many different ways to produce a wide range of material compositions and geometries (OD, 1D, 2D and 3D).

Most traditional style CVD tools are limited in production volume

Karlheinz Strobl, Mathieu Monville, Riju Singhal, Samuel Wright, Leonard Rosenbaum
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, NY 11722, USA

Abstract

Our EasyGraphene™ R&D and production tools enable our patent pending solution for low-cost, high-volume, high quality CVD graphene on Cu foil. Together our EasyGraphene™ system enables:

Better thermal control over the CVD graphene process: Figure 1 (a) is a photograph of a 300 mm x 300 mm 18 µm thick electropolished Cu foil subjected to 2 hour annealing and 2 hour CVD graphene growth at 1020 °C

Karlheinz Strobl, Mathieu Monville, Riju Singhal, and Samuel Wright
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Chemical vapour deposition (CVD) is recognized as the most promising technique for the scale-up of higher quality graphene production for a wide range of applications. There is particular interest in the CVD of graphene on copper, where the number of atomic layers can be controlled down to a monolayer.

The quality of the deposited graphene can be quantified in terms of several physical properties, including

Karlheinz Strobl1, Rune Wendelbo2, Rahul Fotedar2, Riju Shinghal1, and Mathieu Monville1
1CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA
2Graphene Batteries AS, Forskningsveien 1, 0314 Oslo, Norway

Abstract

Battery and ultracapacitor electrodes are traditionally made with at least one polymeric binder material that mechanically holds the various, powder like, raw materials together. In addition to increasing the electrode resistance, the binder is assumed to be at least partially responsible for the performance degradation over time for rechargeable Lithium batteries.

We present here for the

Mathieu R. Monville1, Kongara M. Reddy1, Riju Singhal1, Karlheinz Strobl1
1CVD Equipment Corporation, 355 South Technology Drive, Central Islip, NY 11722, USA

Introduction
The field of nanocarbon-based composite materials is naturally driving and stimulating applied research today because of the high potentialities offered by both nanotechnology and carbon: each nanocarbon species (nanotubes, nanocones, nanowalls, graphene and graphite nanoplatelets, fullerenes and carbon nanodots, etc.) presents its own specific physico-chemical properties and reacts and performs differently under the same conditions, thereby enabling the optimization of material properties for specific applications (energy storage, water

K. Strobl* , M. Monville*, S. Banerjee*, S. Chang*, C. Jayasinghe**, J. Sprengard**
*CVD Equipment Corporation, 355 South Technology Drive, Central Islip, NY 11722, USA
**General Nano, 1776 Mentor Ave, Ste. 170, Cincinnati, OH 45212, USA

ABSTRACT

Electromagnetic interference (EMI) shielding relates to the property of a material that acts as a barrier to the penetration of electromagnetic radiations. EMI shielding plays an important role in fields of application where electromagnetic waves, especially at high frequencies, can interfere with electronics. Applications of EMI shielding span from cellular phones and computers

Karlheinz Strobl, Riju Singhal, Mathieu Monville
CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Graphene, in its one atom thick carbon sheet form, is a special 2 dimensional nanomaterial that bridges the chemical and physical worlds. On the one hand, graphene can be seen as a chemical, a gigantic two-dimensional monomer, allowing organic chemistry to investigate its use as a reactive platform and composite and polymer science to investigate its functionalized forms into dispersed, percolated or continuous architectures, ranging from randomly to highly

Karlheinz Strobl1, Mathieu R. Monville1, Subarna Banerjee1, Shihsheng Chang1
1CVD Equipment Corporation, 355 S. Technology Drive, Central Islip, New York 11722, USA

Abstract

Our standard large area (> m2) CNTSheet™ manufacturing process produces anisotropic porous carbon nanotube sheets in the 10-200μm thickness range. They have electrical and thermal properties that are uniform in the “X” and “Y” direction (sheet plane) and are 1-3 orders of magnitude lower in the “Z” direction. This manufacturing platform, using mm long VASWCNT’s or VAMWCNT’s as the primary mechanically interlocking fiber material, allows